Sputtering Target Market Analysis

  • Report ID: 5018
  • Published Date: Jun 14, 2023
  • Report Format: PDF, PPT

Sputtering Target Market Analysis

Sputtering Target Segmentation

Material (Pure Metal, Compound, Alloy, Isotope, Oxide Targets)

Sputtering target market from the pure metal targets segment is set to generate the highest revenue by the end of 2035. This growth is poised to be influenced by a surge in the use of pure metal targets in different configurations including planar, circular, rectangular, and more for the process of sputter and evaporation. The rise in the production of high-index films for infrared filters, ferromagnetic thin films, semiconducting films, photoconductive films, and lubricating films using these targets also contributes to this segment’s revenue gain.

Sputtering Method (Radio Frequency, Direct Current, Reactive, Magnetron, Gas Flow, Ion-assisted Sputtering)

The magnetron sputtering segment in the sputtering target market is expected to have significant growth shortly. This is owing to the use of magnetron sputtering methods in various industrial applications including the production of corrosion-resistant and low-friction coatings.

Our in-depth analysis of the global market includes the following segments: 

         Material

  • Pure Metal Targets
  • Alloy Targets
  • Compound Targets
  • Oxide Targets
  • Isotope Targets

         Application

  • Aerospace & Defense
  • Electronics & Semiconductors
  • Glass Coating
  • Solar Cell Coating
  • Solid Oxide Fuel Cells

             Sputtering Method

  • Radio Frequency Sputtering
  • Direct Current Sputtering
  • Reactive Sputtering
  • Magnetron Sputtering
  • Gas Flow Sputtering
  • Ion-assisted Sputtering

 


Browse Key Market Insights with Data Illustration:


Author Credits:  Abhishek Verma, Hetal Singh


  • Report ID: 5018
  • Published Date: Jun 14, 2023
  • Report Format: PDF, PPT

Frequently Asked Questions (FAQ)

The major factors driving the growth of the market are growth in demand for consumer electronics, rise in demand for rare earth materials, and surge in the use of sputtering target in automotive production.

The market size of sputtering target is anticipated to attain a CAGR of ~2% over the forecast period, i.e., 2023 – 2035.

The major players in the market are JX Nippon Mining & Metals Corporation, Praxair Technology, Inc., Plansee SE, Mitsui Mining & Smelting Co, Ltd., and more.

The company profiles are selected based on the revenues generated from the product segment, the geographical presence of the company which determines the revenue generating capacity as well as the new products being launched into the market by the company.

The market is segmented by material, application, sputtering method, and by region.

The pure metal targets segment is anticipated to garner the largest market size by the end of 2035 and display significant growth opportunities.

The surge in the use of alternatives, the high price of sputtering target, and damage of some plasma are estimated to be the growth hindering factors for the market expansion.

The market in the North American region is projected to hold the largest market share by the end of 2035 and provide more business opportunities in the future.
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