Top Featured Companies Dominating the Sputtering Target Market
- JX Nippon Mining & Metals Corporation
- Company Overview
- Business Strategy
- Key Product Offerings
- Financial Performance
- Key Performance Indicators
- Risk Analysis
- Recent Development
- Regional Presence
- SWOT Analysis
- Praxair Technology, Inc.
- Plansee SE
- Mitsui Mining & Smelting Co, Ltd.
- Hitachi, Ltd.
- Honeywell International Inc.
- Sumitomo Chemical Co., Ltd.
- ULVAC, Inc.
- Materion Corporation
- GRIKIN Advanced Material Co., Ltd.
Browse key industry insights with market data tables & charts from the report:
Frequently Asked Questions (FAQ)
In the year 2025, the industry size of sputtering target is estimated at USD 6.42 billion.
The sputtering target market size was valued at USD 6.23 billion in 2024 and is likely to cross USD 7.96 billion by 2037, expanding at more than 1.9% CAGR during the forecast period i.e., between 2025-2037. The market growth is driven by growth in demand for consumer electronics, rise in demand for rare earth materials, and surge in the use of sputtering target in automotive production.
North America industry is predicted to dominate majority revenue share of 30% by 2037, backed by growing production of aircraft in the region.
The major players in the market are JX Nippon Mining & Metals Corporation, Praxair Technology, Inc., Plansee SE, Mitsui Mining & Smelting Co, Ltd., Hitachi, Ltd., Honeywell International Inc., Sumitomo Chemical Co., Ltd., ULVAC, Inc., Materion Corporation, GRIKIN Advanced Material Co., Ltd.
