Sputtering Target Market Players:
- JX Nippon Mining & Metals Corporation
- Company Overview
- Business Strategy
- Key Product Offerings
- Financial Performance
- Key Performance Indicators
- Risk Analysis
- Recent Development
- Regional Presence
- SWOT Analysis
- Praxair Technology, Inc.
- Plansee SE
- Mitsui Mining & Smelting Co, Ltd.
- Hitachi, Ltd.
- Honeywell International Inc.
- Sumitomo Chemical Co., Ltd.
- ULVAC, Inc.
- Materion Corporation
- GRIKIN Advanced Material Co., Ltd.
Browse key industry insights with market data tables & charts from the report:
Frequently Asked Questions (FAQ)
In the year 2026, the industry size of sputtering target is estimated at USD 6.53 billion.
The global sputtering target market size was more than USD 6.42 billion in 2025 and is anticipated to grow at a CAGR of over 1.9%, reaching USD 7.75 billion revenue by 2035.
By 2035, North America is anticipated to command a 30% share of the sputtering target market, supported by the expanding production of aircraft.
Key players in the market include JX Nippon Mining & Metals Corporation, Praxair Technology, Inc., Plansee SE, Mitsui Mining & Smelting Co, Ltd., Hitachi, Ltd., Honeywell International Inc., Sumitomo Chemical Co., Ltd., ULVAC, Inc., Materion Corporation, GRIKIN Advanced Material Co., Ltd.
