Sputtering Target Market Size & Share, by Material (Pure Metal, Alloy, Compound, Oxide, Isotope); Application (Aerospace & Defense, Electronics & Semiconductors, Glass Coating, Solar Cell Coating, Solid Oxide Fuel Cells); Sputtering Method (Radio Frequency, Direct Current, Reactive, Magnetron, Gas Flow, Ion-Assisted Sputtering) - Global Supply & Demand Analysis, Growth Forecasts, Statistics Report 2023-2035

  • Report ID: 5018
  • Published Date: Jun 14, 2023
  • Report Format: PDF, PPT

Top Featured Companies Dominating the Sputtering Target Market

    • JX Nippon Mining & Metals Corporation
      • Company Overview
      • Business Strategy
      • Key Product Offerings
      • Financial Performance
      • Key Performance Indicators
      • Risk Analysis
      • Recent Development
      • Regional Presence
      • SWOT Analysis
    • Praxair Technology, Inc.
    • Plansee SE
    • Mitsui Mining & Smelting Co, Ltd.
    • Hitachi, Ltd.
    • Honeywell International Inc.
    • Sumitomo Chemical Co., Ltd.
    • ULVAC, Inc.
    • Materion Corporation
    • GRIKIN Advanced Material Co., Ltd.

Browse Key Market Insights with Data Illustration:


In The News

  • Hannover 96 of the German Bundesliga and Mito HollyHock of the Japan Professional Football League (J. League) have inked partnership agreements with TANIOBIS GmbH, a group company of JX Nippon Mining & Metals Corporation.
  • Hitachi, Ltd. in India announced a partnership with M/s NASH INDUSTRIES, a pioneer in providing solutions with distinctiveness in Design, Precision Sheet Metal Stamping, Fabrication, and Assemblies, to provide controllers for Brushless DC motors with Integrated Single Chip ICs produced at Hitachi Power Semiconductor Device, Ltd. Japan.

Author Credits:  Abhishek Verma, Hetal Singh

  • Report ID: 5018
  • Published Date: Jun 14, 2023
  • Report Format: PDF, PPT

Frequently Asked Questions (FAQ)

The major factors driving the growth of the market are growth in demand for consumer electronics, rise in demand for rare earth materials, and surge in the use of sputtering target in automotive production.

The market size of sputtering target is anticipated to attain a CAGR of ~2% over the forecast period, i.e., 2023 – 2035.

The major players in the market are JX Nippon Mining & Metals Corporation, Praxair Technology, Inc., Plansee SE, Mitsui Mining & Smelting Co, Ltd., and more.

The company profiles are selected based on the revenues generated from the product segment, the geographical presence of the company which determines the revenue generating capacity as well as the new products being launched into the market by the company.

The market is segmented by material, application, sputtering method, and by region.

The pure metal targets segment is anticipated to garner the largest market size by the end of 2035 and display significant growth opportunities.

The surge in the use of alternatives, the high price of sputtering target, and damage of some plasma are estimated to be the growth hindering factors for the market expansion.

The market in the North American region is projected to hold the largest market share by the end of 2035 and provide more business opportunities in the future.
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