Cerium Oxide Nanoparticles Market Segmentation:
Application Segment Analysis
Chemical mechanical planarization segment is poised to capture substantial cerium oxide nanoparticles market share by 2035. The growth of the segment is set to be attributed to growing production of semiconductor. In the semiconductor manufacturing sector, chemical mechanical planarization, or CMP, is a technique for polishing wafer surfaces. Nanoparticle-containing CMP slurries are increasingly employed to reduce the size of the electronic device and improve manufacturing process yield. Due to their potential to impact the prominence of the silicon wafers, the examination of the CMP slurry nanoparticle size distribution and the identification of larger particles are essential elements of quality control of the photolithography process. Due to their sensitivity, versatility, and analytical speed, cerium oxide nanoparticles are increasingly used for identifying and quantifying inorganic-based nanoparticles.
Form Segment Analysis
Dispersion segment is expected to hold remarkable cerium oxide nanoparticles market share by the end of 2035. Water or a number of organic solvents, such as ethanol or mineral oil, may be employed to create cerium oxide nanoparticle dispersions. As a buffer layer for superconductors, coating for infrared filters, catalyst, and catalyst support, electrolyte and/or electrode materials for solid oxide fuel cells, coloring agents for plastics, infrared absorbents, heat-resistant alloy coatings, oxidation-resistant coatings, oxygen sensors, oxygen pumps, polishing media for electronic devices, glasses, and bearing balls, ultraviolet absorbent, and sintering additives are just a few applications.
Our in-depth analysis of the global cerium oxide nanoparticles market includes the following segments:
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